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| No. | Article |
|---|---|
| 1 |
Resist processes for hybrid (electron-beam deep ultraviolet) lithography Tedesco S, Mourier T, Dal'zotto B, McDougall A, Blanc-Coquant S, Quere Y, Paniez PJ, Mortini B Journal of Vacuum Science & Technology B, 16(6), 3676, 1998 |