검색결과 : 1건
No. | Article |
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1 |
Metallorganic chemical vapor deposition of hafnium silicate thin films using a dual source dimethyl-alkylamido approach Consiglio S, Papadatos F, Naczas S, Skordas S, Eisenbraun ET, Kaloyeros AE Journal of the Electrochemical Society, 153(11), F249, 2006 |