화학공학소재연구정보센터
검색결과 : 12건
No. Article
1 Superconducting platinum suicide for electron cooling in silicon
Prest MJ, Richardson-Bullock JS, Zhao QT, Muhonen JT, Gunnarsson D, Prunnila M, Shah VA, Whall TE, Parker EHC, Leadley DR
Solid-State Electronics, 103, 15, 2015
2 Comparison of electron-phonon and hole-phonon energy loss rates in silicon
Richardson-Bullock JS, Prest MJ, Shah VA, Gunnarsson D, Prunnila M, Dobbie A, Myronov M, Morris RJH, Whall TE, Parker EHC, Leadley DR
Solid-State Electronics, 103, 40, 2015
3 Flat single crystal Ge membranes for sensors and opto-electronic integrated circuitry
Shah VA, Myronov M, Rhead SD, Halpin JE, Shchepetov A, Prest MJ, Prunnila M, Whall TE, Parker EHC, Leadley DR
Solid-State Electronics, 98, 93, 2014
4 Improved effective mobility extraction in MOSFETs
Thomas SM, Whall TE, Parker EHC, Leadley DR, Lander RJP, Vellianitis G, Watling JR
Solid-State Electronics, 53(12), 1252, 2009
5 Impact of strain and channel orientation on the low-frequency noise performance of Si n- and pMOSFETs
von Haartman M, Malm BG, Hellstrom PE, Ostling M, Grasby TJ, Whall TE, Parker EHC, Lyutovich K, Oehme M, Kasper E
Solid-State Electronics, 51(5), 771, 2007
6 Low-frequency noise suppression and dc characteristics enhancement in sub-mu m metamorphic p-MOSFETs with strained Si0.3Ge0.7 channel grown by MBE
Myronov M, Durov S, Mironov OA, Parker EHC, Whall TE, Hackbarth T, Hock G, Herzog HJ, Konig U
Applied Surface Science, 224(1-4), 265, 2004
7 SiGe(C) epitaxial technologies - issues and prospectives
Grasby TJ, Whall TE, Parker EHC
Thin Solid Films, 412(1-2), 44, 2002
8 Ultra low energy SIMS, XTEM and X-ray diffraction methods for the characterization of a MBE grown short period (SinGem)(16) superlattices
Mironov OA, Fulgoni DJF, Parry CP, Cooke GA, Dowsett MG, Parker EHC, Chtcherbatchev KD, Bassas JM, Romano-Rodriguez A, Perez-Rodriguez A, Morante JR
Thin Solid Films, 367(1-2), 176, 2000
9 SiGe - heterostructures for CMOS technology
Whall TE, Parker EHC
Thin Solid Films, 367(1-2), 250, 2000
10 Si/SiGe/Si pMOS performance - alloy scattering and other considerations
Whall TE, Parker EHC
Thin Solid Films, 369(1-2), 297, 2000