검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Wet cleaning of cross-contamination of high-k dielectrics in plasma etch tool Pandit V, Parks HG, Vermeire B, Raghavan S Journal of the Electrochemical Society, 153(11), G970, 2006 |
| 2 |
Reduction of surface roughening due to copper contamination prior to ultra-thin gate oxidation Peterson CA, Vermeire B, Sarid D, Parks HG Applied Surface Science, 181(1-2), 28, 2001 |
| 3 |
Effects of moisture on Fowler-Nordheim characterization of thin silicon-oxide films Peterson CA, Workman RK, Sarid D, Vermeire B, Parks HG, Adderton D, Maivald P Journal of Vacuum Science & Technology A, 17(5), 2753, 1999 |
| 4 |
A comparative electrchemical study of copper deposition onto silicon from dilute and buffered hydrofluoric acids Li G, Kneer EA, Vermeire B, Parks HG, Raghavan S, Jeon JS Journal of the Electrochemical Society, 145(1), 241, 1998 |
| 5 |
Electrochemical impedance spectroscopy of copper deposition on silicon from dilute hydrofluoric acid solutions Cheng X, Li G, Kneer EA, Vermeire B, Parks HG, Raghavan S, Jeon JS Journal of the Electrochemical Society, 145(1), 352, 1998 |
| 6 |
Electrochemical Investigation of Copper Contamination on Silicon-Wafers from HF Solutions Jeon JS, Raghavan S, Parks HG, Lowell JK, Ali I Journal of the Electrochemical Society, 143(9), 2870, 1996 |
| 7 |
Deposition of Copper from a Buffered Oxide Etchant Onto Silicon-Wafers Yoneshige KK, Parks HG, Raghavan S, Hiskey JB, Resnick PJ Journal of the Electrochemical Society, 142(2), 671, 1995 |