1 |
Validating gallium nitride growth kinetics using a precursor delivery showerhead as a novel chemical reactor Parikh RP, Adomaitis RA, Aumer ME, Partlow DP, Thomson DB, Rubloff GW Journal of Crystal Growth, 296(1), 15, 2006 |
2 |
In situ chemical sensing in AlGaN/GaN high electron mobility transistor metalorganic chemical vapor-deposition process for real-time prediction of product crystal quality and advanced process control Cho S, Rubloff GW, Aumer ME, Thomson DB, Partlow DP, Parikh R, Adomaitis RA Journal of Vacuum Science & Technology B, 23(4), 1386, 2005 |
3 |
Real-time material quality prediction, fault detection, and contamination control in AlGaN/GaN high electron mobility transistor metalorganic chemical vapor deposition process using in situ chemical sensing Cho S, Rubloff GW, Aumer ME, Thomson DB, Partlow DP Journal of Vacuum Science & Technology B, 23(5), 1849, 2005 |
4 |
In situ chemical sensing in AlGaN/GaN metal organic chemical vapor deposition process for precision film thickness metrology and real-time advanced process control Cho S, Janiak DS, Rubloff GW, Aumer ME, Thomson DB, Partlow DP Journal of Vacuum Science & Technology B, 23(5), 2007, 2005 |