화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Deep-Level Transient Spectroscopy Study of the Damage-Induced in N-Type Silicon by a Gate Oxide Etching in a Chf3/Ar Plasma
Adegboyega G, Perezquintana I, Poggi A, Susi E, Merli M
Journal of Vacuum Science & Technology B, 15(3), 623, 1997
2 Study of the Electrical Active Defects Induced by Reactive Ion Etching in N-Type Silicon
Biavati M, Perezquintana I, Poggi A, Susi E
Journal of Vacuum Science & Technology B, 13(5), 2139, 1995