| 1 |
Gate etch process model for static random access memory bit cell and FinFET construction
Stout PJ, Rauf S, Peters RD, Ventzek PLG
Journal of Vacuum Science & Technology B, 24(4), 1810, 2006 |
| 2 |
A near edge X-ray absorption fine structure spectroscopy investigation of the structure of self-assembled films of octadecyltrichlorosilane
Peters RD, Nealey PF, Crain JN, Himpsel FJ
Langmuir, 18(4), 1250, 2002 |
| 3 |
Morphology of thin films of diblock copolymers on surfaces micropatterned with regions of different interfacial energy
Peters RD, Yang XM, Nealey PF
Macromolecules, 35(5), 1822, 2002 |
| 4 |
Imaging the substrate/film interface of thin films of diblock copolymers on chemically patterned surfaces
Yang XM, Peters RD, Nealey PF
Macromolecules, 35(6), 2406, 2002 |
| 5 |
Proximity X-ray lithography using self-assembled alkylsiloxane films: Resolution and pattern transfer
Yang XM, Peters RD, Kim TK, Nealey PF, Brandow SL, Chen MS, Shirey LM, Dressick WJ
Langmuir, 17(1), 228, 2001 |
| 6 |
Dependence of the glass transition temperature of polymer films on interfacial energy and thickness
Fryer DS, Peters RD, Kim EJ, Tomaszewski JE, de Pablo JJ, Nealey PF, White CC, Wu WL
Macromolecules, 34(16), 5627, 2001 |
| 7 |
Chemical modification of self-assembled monolayers by exposure to soft X-rays in air
Kim TK, Yang XM, Peters RD, Sohn BH, Nealey PF
Journal of Physical Chemistry B, 104(31), 7403, 2000 |
| 8 |
Combining advanced lithographic techniques and self-assembly of thin films of diblock copolymers to produce templates for nanofabrication
Peters RD, Yang XM, Wang Q, de Pablo JJ, Nealey PF
Journal of Vacuum Science & Technology B, 18(6), 3530, 2000 |
| 9 |
Using self-assembled monolayers exposed to X-rays to control the wetting behavior of thin films of diblock copolymers
Peters RD, Yang XM, Kim TK, Sohn BH, Nealey PF
Langmuir, 16(10), 4625, 2000 |
| 10 |
Wetting behavior of block copolymers on self assembled films of alkylchlorosiloxanes: Effect of grafting density
Peters RD, Yang XM, Kim TK, Nealey PF
Langmuir, 16(24), 9620, 2000 |
