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| No. | Article |
|---|---|
| 1 |
Langmuir Probe Measurements During Plasma-Activated Chemical-Vapor-Deposition in the System Argon/Hydrogen/Dicyclopentadienyldimethylhafium Spatenka P, Petig M, Wiesemann K, Suhr H Plasma Chemistry and Plasma Processing, 15(3), 371, 1995 |