검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Evolution of electron projection optics from variable axis immersion lenses to projection reduction exposure with variable axis immersion lenses Stickel W, Pfeiffer HC, Golladay SD, Gordon MS Journal of Vacuum Science & Technology B, 20(6), 2627, 2002 |
| 2 |
PREVAIL-EPL alpha tool: Early results Golladay SD, Pfeiffer HC, Bohnenkamp CA, Dhaliwal RS, Enichen WA, Gordon MS, Kendall RA, Lieberman JE, Stickel W, Rockrohr JD, Tressler EV, Tanimoto A, Yamaguchi T, Okamoto K, Suzuki K, Miura T, Okino T, Kawata S, Morita K, Suzuki SC, Shimizu H, Kojima S, Varnell G, Novak WT, Sogard M Journal of Vacuum Science & Technology B, 19(6), 2459, 2001 |
| 3 |
PREVAIL Alpha system: Status and design considerations Golladay SD, Pfeiffer HC, Rockrohr JD, Stickel W Journal of Vacuum Science & Technology B, 18(6), 3072, 2000 |
| 4 |
PREVAIL: Dynamic correction of aberrations Gordon MS, Enichen WA, Golladay SD, Pfeiffer HC, Robinson CF, Stickel W Journal of Vacuum Science & Technology B, 18(6), 3079, 2000 |
| 5 |
Projection reduction exposure with variable axis immersion lenses: Next generation lithography Pfeiffer HC, Dhaliwal RS, Golladay SD, Doran SK, Gordon MS, Groves TR, Kendall RA, Lieberman JE, Petric PF, Pinckney DJ, Quickle RJ, Robinson CF, Rockrohr JD, Senesi JJ, Stickel W, Tressler EV, Tanimoto A, Yamaguchi T, Okamoto K, Suzuki K, Okino T, Kawata S, Morita K, Suziki SC, Shimizu H, Kojima S, Varnell G, Novak WT, Stumbo DP, Sogard M Journal of Vacuum Science & Technology B, 17(6), 2840, 1999 |
| 6 |
EL5: One tool for advanced x-ray and chrome on glass mask making Sturans MA, Hartley JG, Pfeiffer HC, Dhaliwal RS, Groves TR, Pavick JW, Quickle RJ, Clement CS, Dick GJ, Enichen WA, Gordon MS, Kendall RA, Kostek CA, Pinckney DJ, Robinson CF, Rockrohr JD, Safran JM, Senesi JJ, Tressler EV Journal of Vacuum Science & Technology B, 16(6), 3164, 1998 |
| 7 |
Performance Enhancements on IBMs El-4 Electron-Beam Lithography System Butsch R, Enichen WA, Gordon MS, Groves TR, Hartley JG, Pavick JW, Pfeiffer HC, Quickle RJ, Rockrohr JD, Stickel W Journal of Vacuum Science & Technology B, 13(6), 2478, 1995 |
| 8 |
El-4, a New-Generation Electron-Beam Lithography System Pfeiffer HC, Davis DE, Enichen WA, Gordon MS, Groves TR, Hartley JG, Quickle RJ, Rockrohr JD, Stickel W, Weber EV Journal of Vacuum Science & Technology B, 11(6), 2332, 1993 |