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| No. | Article |
|---|---|
| 1 |
Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase-Shifting Masks with Optimized Illumination Ronse K, Pforr R, Baik KH, Jonckheere R, Vandenhove L Journal of Vacuum Science & Technology B, 12(6), 3783, 1994 |