검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
On the contributions of the electronic polarizability and porosity to the reduction of the refractive index of SiOF films deposited by remote plasma-enhanced chemical vapor deposition Alonso JC, Diaz-Bucio XM, Pichardo E, Rodriguez-Fernandez L, Ortiz A Thin Solid Films, 474(1-2), 294, 2005 |
| 2 |
Fluorinated-chlorinated SiO2 films prepared at low temperature by remote plasma-enhanced chemical-vapor deposition using mixtures of SiF4 and SiCl4 Alonso JC, Pichardo E, Rodriguez-Fernandez L, Cheang-Wong JC, Ortiz A Journal of Vacuum Science & Technology A, 19(2), 507, 2001 |
| 3 |
Effect of hydrogen dilution on the structure of SiOF films prepared by remote plasma enhanced chemical vapor deposition from SiF4-based plasmas Alonso JC, Pichardo E, Pankov V, Ortiz A Journal of Vacuum Science & Technology A, 18(6), 2827, 2000 |