화학공학소재연구정보센터
검색결과 : 9건
No. Article
1 Determination of silicon oxide precipitate stoichiometry using global and local techniques
Nicolai J, Burle N, Pichaud B
Journal of Crystal Growth, 363, 93, 2013
2 Characterizing and modeling the evolution of silicon oxide precipitates during thermal cycles
Nicolai J, Burle N, Serafino C, Pichaud B
Journal of Crystal Growth, 372, 138, 2013
3 Effect of Si and He implantation in the formation of ultra shallow junctions in Si
Xu M, Regula G, Daineche R, Oliviero E, Hakim B, Ntsoenzok E, Pichaud B
Thin Solid Films, 518(9), 2354, 2010
4 Structural characterization of nc-Si films grown by low-energy PECVD on different substrates
Le Donne A, Binetti S, Isella G, Pichaud B, Texier M, Acciarri M, Pizzini S
Applied Surface Science, 254(9), 2804, 2008
5 Dynamical study of dislocations and 4H -> 3C transformation induced by stress in (11-20) 4H-SiC
Idrissi H, Lancin M, Douin J, Regula G, Pichaud B
Materials Science Forum, 483, 299, 2005
6 High temperature Si(001) surface defect evolution during extended annealing: experimental results and modelling
Barge D, Pichaud B, Joly JP
Applied Surface Science, 226(4), 341, 2004
7 Study of dislocation mobility in 4H SiC by X-Ray transmission topography, chemical etching and transmission electron microscopy
Idrissi H, Lancin M, Regula G, Pichaud B
Materials Science Forum, 457-460, 355, 2004
8 Microstructure and Residual-Stresses in (111)Au/Ni Multilayers
Labat S, Pichaud B, Thomas O, Alfonso C, Charai A, Barrallier L, Gilles B, Marty A
Thin Solid Films, 275(1-2), 29, 1996
9 X-Ray Study of Relaxation Process of Strained GaAs-Layers Grown on (100) Ge Substrates
Burle N, Pichaud B, Guelton N, Saintjacques RG
Thin Solid Films, 260(1), 65, 1995