화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Behaviour of TFMS and CPW line on SOI substrate versus high temperature for RF applications
Moussa MS, Pavageau C, Lederer D, Picheta L, Danneville F, Fel N, Russat J, Raskin JP, Vanhoenacker-Janvier D
Solid-State Electronics, 50(11-12), 1822, 2006
2 0.25 mu m fully depleted SOI MOSFETs for RF mixed analog-digital circuits, including a comparison with partially depleted devices with relation to high frequency noise parameters
Vanmackelberg M, Raynaud C, Faynot O, Pelloie JL, Tabone C, Grouillet A, Martin F, Dambrine G, Picheta L, Mackowiak E, Llinares P, Sevenhans J, Compagne E, Fletcher G, Flandre D, Dessard V, Vanhoenacker D, Raskin JP
Solid-State Electronics, 46(3), 379, 2002