화학공학소재연구정보센터
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No. Article
1 Preferential orientation effects in partial melt laser crystallization of silicon
Witte DJ, Masbou MPA, Crnogorac F, Pease RFW, Pickard DS
Journal of Vacuum Science & Technology B, 26(6), 2455, 2008
2 Rapid partial melt crystallization of silicon for monolithic three-dimensional integration
Witte DJ, Pickard DS, Crnogorac F, Pianetta P, Pease RFW
Journal of Vacuum Science & Technology B, 25(6), 1989, 2007
3 Monolithic multichannel secondary electron detector for distributed axis electron beam lithography and inspection
Pickard DS, Kenney C, Tanimoto S, Crane T, Groves T, Pease RFW
Journal of Vacuum Science & Technology B, 25(6), 2277, 2007
4 Distributed axis electron beam technology for maskless lithography and defect inspection
Pickard DS, Groves TR, Meisburger WD, Crane T, Pease RF
Journal of Vacuum Science & Technology B, 21(6), 2834, 2003
5 Distributed axis electron-beam system for lithography and inspection - preliminary experimental results
Pickard DS, Campbell C, Crane T, Cruz-Rivera LJ, Davenport A, Meisburger WD, Pease RFW, Groves TR
Journal of Vacuum Science & Technology B, 20(6), 2662, 2002
6 Charging and discharging of electron beam resist films
Bai M, Pease RFW, Tanasa C, McCord MA, Pickard DS, Meisburger D
Journal of Vacuum Science & Technology B, 17(6), 2893, 1999
7 Maskless extreme ultraviolet lithography
Choksi N, Pickard DS, McCord M, Pease RFW, Shroff Y, Chen YJ, Oldham W, Markle D
Journal of Vacuum Science & Technology B, 17(6), 3047, 1999
8 Patterned negative electron affinity photocathodes for maskless electron beam lithography
Schneider JE, Sen P, Pickard DS, Winograd GI, McCord MA, Pease RFW, Spicer WE, Baum AW, Costello KA, Davis GA
Journal of Vacuum Science & Technology B, 16(6), 3192, 1998
9 Lifetime and reliability results for a negative electron affinity photocathode in a demountable vacuum system
Sen P, Pickard DS, Schneider JE, McCord MA, Pease RF, Baum AW, Costello KA
Journal of Vacuum Science & Technology B, 16(6), 3380, 1998
10 Development of Ion Sources for Ion Projection Lithography
Lee Y, Gough RA, Kunkel WB, Leung KN, Perkins LT, Pickard DS, Sun L, Vujic J, Williams MD
Journal of Vacuum Science & Technology B, 14(6), 3947, 1996