검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties Dingemans G, van Helvoirt CAA, Pierreux D, Keuning W, Kessels WMM Journal of the Electrochemical Society, 159(3), H277, 2012 |
| 2 |
Influence of the Oxidant on the Chemical and Field-Effect Passivation of Si by ALD Al2O3 Dingemans G, Terlinden NM, Pierreux D, Profijt HB, van de Sanden MCM, Kessels WMM Electrochemical and Solid State Letters, 14(1), H1, 2011 |
| 3 |
Atomic Layer Deposition of Strontium Titanate Films Using Sr((Bu3Cp)-Bu-t)(2) and Ti(OMe)(4) Popovici M, Van Elshocht S, Menou N, Swerts J, Pierreux D, Delabie A, Brijs B, Conard T, Opsomer K, Maes JW, Wouters DJ, Kittl JA Journal of the Electrochemical Society, 157(1), G1, 2010 |
| 4 |
Atomic Layer Deposition of Gd-Doped HfO2 Thin Films Adelmann C, Tielens H, Dewulf D, Hardy A, Pierreux D, Swerts J, Rosseel E, Shi X, Van Bael MK, Kittl JA, Van Elshocht S Journal of the Electrochemical Society, 157(4), G105, 2010 |
| 5 |
Alternative high-k dielectrics for semiconductor applications Van Elshocht S, Adelmann C, Clima S, Pourtois G, Conard T, Delabie A, Franquet A, Lehnen P, Meersschaut J, Menou N, Popovici M, Richard O, Schram T, Wang XP, Hardy A, Dewulf D, Van Bael MK, Lehnen P, Blomberg T, Pierreux D, Swerts J, Maes JW, Wouters DJ, De Gendt S, Kittl JA Journal of Vacuum Science & Technology B, 27(1), 209, 2009 |