| 1 |
Mechanical stability measurements of surface modified nanoparticle agglomerates
Post P, Bierwirth M, Weber AP
Journal of Aerosol Science, 126, 33, 2018 |
| 2 |
The effects of V/III gas ratios on the catalyst-assisted growths of InGaN nanowires
Tang WC, Hong FCN
Applied Surface Science, 354, 173, 2015 |
| 3 |
Effect of methane concentration in hydrogen plasma on hydrogen impurity incorporation in thick large-grained polycrystalline diamond films
Tang CJ, Fernandes AJS, Jiang XF, Pinto JL, Ye H
Journal of Crystal Growth, 426, 221, 2015 |
| 4 |
Growths of indium gallium nitride nanowires by plasma-assisted chemical vapor deposition
Tang WC, Hong FCN
Thin Solid Films, 570, 315, 2014 |
| 5 |
Characterization and Hepatocytes Adhesion of Galactosylated Poly(D,L-lactic-co-glycolic acid) Surface
Choi L, Kwak SJ, You SJ, Chun HJ, Kim HL, Shim YB, Kim MS, Park KD
Macromolecular Research, 20(1), 93, 2012 |
| 6 |
Low-temperature preparation of phosphorus doped mu c-Si:H thin films by low-frequency inductively coupled plasma assisted chemical vapor deposition
Yan WS, Wei DY, Guo YN, Xu S, Ong TM, Sern CC
Thin Solid Films, 520(6), 1724, 2012 |
| 7 |
Microstructural and frictional control of diamond-like carbon films deposited on acrylic rubber by plasma assisted chemical vapor deposition
Martinez-Martinez D, Schenkel M, Pei YT, De Hosson JTM
Thin Solid Films, 519(7), 2213, 2011 |
| 8 |
Effect of impinging ion energy on the substrates during deposition of SiOx films by radiofrequency plasma enhanced chemical vapor deposition process
Choudhury AJ, Barve SA, Chutia J, Kakati H, Pal AR, Jagannath, Mithal N, Kishore R, Pandey M, Patil DS
Thin Solid Films, 519(22), 7864, 2011 |
| 9 |
The influence of CH4 addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH4/N-2/Ar/hexamethyldisilazane microwave plasma
Bulou S, Le Brizoual L, Miska P, de Poucques L, Hugon R, Belmahi M, Bougdira J
Thin Solid Films, 520(1), 245, 2011 |
| 10 |
Synthesis and characterization of plasma assisted chemically vapor deposited tantalum
Suh Y, Chen W, Maeng S, Gu S, Levy RA, Thridandam H
Thin Solid Films, 518(19), 5452, 2010 |
