| 1 |
How Hydrogen Admixture Changes Plasma Jet Characteristics in Spray Processes at Low Pressure
Mauer G
Plasma Chemistry and Plasma Processing, 41(1), 109, 2021 |
| 2 |
Plasma Parameters and Silicon Etching Kinetics in C4F8 + O-2 + Ar Gas Mixture: Effect of Component Mixing Ratios
Lee BJ, Efremov A, Nam Y, Kwon KH
Plasma Chemistry and Plasma Processing, 40(5), 1365, 2020 |
| 3 |
Study on the surface energy characteristics of polydimethylsiloxane (PDMS) films modified by C4F8/O-2/Ar plasma treatment
Kim YG, Lim N, Kim J, Kim C, Lee J, Kwon KH
Applied Surface Science, 477, 198, 2019 |
| 4 |
Beryllium thin films deposited by thermionic vacuum arc for nuclear applications
Tiron V, Porosnicu C, Dinca P, Velicu IL, Cristea D, Munteanu D, Revesz A, Stoian G, Lungu CP
Applied Surface Science, 481, 327, 2019 |
| 5 |
Overcoming the insulating materials limitation in HiPIMS: Ion-assisted deposition of DLC coatings using bipolar HiPIMS
Tiron V, Ursu EL, Cristea D, Munteanu D, Bulai G, Ceban A, Velicu IL
Applied Surface Science, 494, 871, 2019 |
| 6 |
Characteristics of the preplasma formation using an uncompressed picosecond-long laser pulse with a large spot size on Al and mylar targets
Phung VLJ, Kim M, Kim J, Uhm HS, Suk H
Current Applied Physics, 19(7), 829, 2019 |
| 7 |
Etching Kinetics and Mechanisms of SiC Thin Films in F-, Cl- and Br-Based Plasma Chemistries
Lee BJ, Efremov A, Lee J, Kwon KH
Plasma Chemistry and Plasma Processing, 39(1), 325, 2019 |
| 8 |
The Effect of Background Gas on the Excitation Temperature and Electron Number Density of Basalt Plasma Induced by 10.6 Micron Laser Radiation
Momcilovic M, Zivkovic S, Kuzmanovic M, Ciganovic J, Rankovic D, Trtica M, Savovic J
Plasma Chemistry and Plasma Processing, 39(4), 985, 2019 |
| 9 |
Hybrid magnetron sputtering and pulsed laser ablation for the deposition of composite ZnO-Au films
Depablos-Rivera O, Sanchez-Ake C, Alvarez-Mendoza R, Garcia-Fernandez T, Muhl S, Villagran-Muniz M
Thin Solid Films, 685, 66, 2019 |
| 10 |
On the Control of Plasma Parameters and Active Species Kinetics in CF4 + O-2 + Ar Gas Mixture by CF4/O-2 and O-2/Ar Mixing Ratios
Efremov A, Lee J, Kim J
Plasma Chemistry and Plasma Processing, 37(5), 1445, 2017 |
