검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Fluorocarbon polymer formation, characterization, and reduction in polycrystalline-silicon etching with CF4-added plasma Xu SL, Sun ZW, Chen A, Qian XY, Podlesnik D Journal of Vacuum Science & Technology A, 19(3), 871, 2001 |
| 2 |
Wall-dependent etching characteristics of organic antireflection coating in O-2+halogen/hydrogen halide plasma Xu SL, Lill T, Podlesnik D Journal of Vacuum Science & Technology A, 19(6), 2893, 2001 |
| 3 |
Characteristics and mechanism of etch process sensitivity to chamber surface condition Xu SL, Sun ZW, Qian XY, Holland J, Podlesnik D Journal of Vacuum Science & Technology B, 19(1), 166, 2001 |