화학공학소재연구정보센터
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No. Article
1 Probing the local pH of polymer photoresist films using a two-color single molecule nanoprobe
Mason MA, Ray K, Pohlers G, Cameron JF, Grober RD
Journal of Physical Chemistry B, 107(51), 14219, 2003
2 Calibration and validation of projection lithography focusing by fluorescence detection of latent photoacid images in chemically amplified resist
Feke GD, Grober RD, Pohlers G, Cameron JF
Journal of Vacuum Science & Technology B, 20(1), 164, 2002
3 An in situ method for measuring acid loss from polymer films
Coenjarts C, Cameron J, Pohlers G, Scaiano JC, Zampini A
Journal of Applied Polymer Science, 78(11), 1897, 2000
4 Ionic vs free radical pathways in the direct and sensitized photochemistry of 2-(4 '-methoxynaphthyl)-4,6-bis(trichloromethyl)-1,3,5-triazine: Relevance for photoacid generation
Pohlers G, Scaiano JC, Stepp E, Sinta R
Journal of the American Chemical Society, 121(26), 6167, 1999
5 Intrazeolite photochemistry. 22. Acid-base properties of coumarin 6. Characterization in solution, the solid state, and incorporated into supramolecular systems
Corrent S, Hahn P, Pohlers G, Connolly TJ, Scaiano JC, Fornes V, Garcia H
Journal of Physical Chemistry B, 102(30), 5852, 1998