화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Investigation of polycrystalline nickel silicide films as a gate material
Qin M, Poon VMC, Ho SCH
Journal of the Electrochemical Society, 148(5), G271, 2001
2 Characterization of MOSFETs fabricated on large-grain polysilicon on insulator
Jagar S, Chan MS, Wang HM, Poon VMC, Myasnikov AM
Solid-State Electronics, 45(5), 743, 2001
3 Young's modulus measurement of nickel silicide film on crystal silicon by a surface profiler
Qin M, Poon VMC
Journal of Materials Science Letters, 19(24), 2243, 2000