화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Plasma etching of dielectric films with novel iodofluorocarbon chemistries : Iodotrifluoroethylene and 1-iodoheptafluoropropane
Karecki SM, Pruette LC, Reif R
Journal of Vacuum Science & Technology A, 16(2), 755, 1998
2 Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry
Pruette LC, Karecki SM, Reif R, Langan JG, Rogers SA, Ciotti RJ, Felker BS
Journal of Vacuum Science & Technology A, 16(3), 1577, 1998