검색결과 : 2건
No. | Article |
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1 |
Plasma etching of dielectric films with novel iodofluorocarbon chemistries : Iodotrifluoroethylene and 1-iodoheptafluoropropane Karecki SM, Pruette LC, Reif R Journal of Vacuum Science & Technology A, 16(2), 755, 1998 |
2 |
Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry Pruette LC, Karecki SM, Reif R, Langan JG, Rogers SA, Ciotti RJ, Felker BS Journal of Vacuum Science & Technology A, 16(3), 1577, 1998 |