검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Duty ratio-controlled reflective property of silicon nitride films deposited at room temperature using a pulsed-PECVD at SiH4-NH3 plasma Kim D, Lee S, Kim B, Kang BJ, Kim D Current Applied Physics, 11(1), S43, 2011 |
| 2 |
Radio frequency source power-induced ion energy impact on SiN films deposited by using a pulsed-PECVD in SiH4-N-2 plasma at room temperature Lee H, Kim B, Kwon S Current Applied Physics, 10(3), 971, 2010 |
| 3 |
Physico-chemical, structural and physical properties of hydrogenated silicon oxinitride films elaborated by pulsed radiofrequency discharge Bedjaoui M, Despax B Thin Solid Films, 518(15), 4142, 2010 |