검색결과 : 12건
No. | Article |
---|---|
1 |
Hydrogen Peroxide Production in an Atmospheric Pressure RF Glow Discharge: Comparison of Models and Experiments Vasko CA, Liu DX, van Veldhuizen EM, Iza F, Bruggeman PJ Plasma Chemistry and Plasma Processing, 34(5), 1081, 2014 |
2 |
Atmospheric pressure RF (13.56 MHz) glow discharge: Characterization and application to "in line'' waste water treatment Castro J, Guerra-Mutis MH, Dulce HJ Plasma Chemistry and Plasma Processing, 23(2), 297, 2003 |
3 |
Microcrystalline materials and cells deposited by RF glow discharge Kondo M Solar Energy Materials and Solar Cells, 78(1-4), 543, 2003 |
4 |
Microcrystallisation in Si : H: the effect of gas pressure in Ar-diluted SiH4 plasma Jana M, Das D Solar Energy Materials and Solar Cells, 79(4), 519, 2003 |
5 |
Depth profiling of electrically non-conductive layered samples by RF-GDOES and HFM plasma SNMS Hodoroaba VD, Unger WES, Jenett H, Hoffmann V, Hagenhoff B, Kayser S, Wetzig K Applied Surface Science, 179(1-4), 30, 2001 |
6 |
Optical emission spectroscopy study toward high rate growth of microcrystalline silicon Fukuda Y, Sakuma Y, Fukai C, Fujimura Y, Azuma K, Shirai H Thin Solid Films, 386(2), 256, 2001 |
7 |
Role of the surface roughness in laser induced crystallization of nanostructured silicon films Hadjadj A, Boufendi L, Huet S, Schelz S, Cabarrocas PRI, Estrade-Szwarckopf H, Rousseau B Journal of Vacuum Science & Technology A, 18(2), 529, 2000 |
8 |
Glow discharge plasma deposited hexafluoropropylene films: surface chemistry and interfacial materials properties Garrison MD, Luginbuhl R, Overney RM, Ratner BD Thin Solid Films, 352(1-2), 13, 1999 |
9 |
Interelectrode separation effects on a-SiGe : H films prepared by plasma chemical vapor deposition Sali JV, Rashad A, Marathe BR, Takwale MG, Gangurde KD, Shaligram AD Thin Solid Films, 322(1-2), 1, 1998 |
10 |
Tunable Diode-Laser Spectroscopy Measurement of CH3 and C2H2 Densities in a H2O/CH3OH Radio-Frequency Chemical-Vapor-Deposition Diamond System Kim SC, Billesbach DP, Dillon R Journal of Vacuum Science & Technology A, 15(4), 2247, 1997 |