검색결과 : 47건
| No. | Article |
|---|---|
| 1 |
Study on efficiency improvement of multi-crystalline silicon solar cell by removing by-product and plasma induced damage generated during reactive ion etching Kim MJ, Min KH, Park S, Song HE, Lee JI, Jeong KT, Park JS, Kang MG Current Applied Physics, 20(4), 519, 2020 |
| 2 |
대기압 플라즈마를 이용한 결정질 태양전지 표면 식각 공정 황상혁, 권희태, 김우재, 최진우, 신기원, 양창실, 권기청 Korean Journal of Materials Research, 27(4), 211, 2017 |
| 3 |
Recombination-free reactive ion etch for high efficiency silicon solar cells Zin N Solar Energy Materials and Solar Cells, 172, 55, 2017 |
| 4 |
Different methods to alter surface morphology of high aspect ratio structures Leber M, Shandhi MMH, Hogan A, Solzbacher F, Bhandari R, Negi S Applied Surface Science, 365, 180, 2016 |
| 5 |
Effects and mechanisms of RIE on SiC inversion layer mobility and its recovery Liu G, Xu Y, Xu C, Basile A, Wang F, Dhar S, Conrad E, Mooney P, Gustafsson T, Feldman LC Applied Surface Science, 324, 30, 2015 |
| 6 |
Monitoring of (reactive) ion etching (RIE) with reflectance anisotropy spectroscopy (RAS) equipment Barzen L, Richter J, Fouckhardt H, Wahl M, Kopnarsk M Applied Surface Science, 328, 120, 2015 |
| 7 |
Influence of plasma composition on reflectance anisotropy spectra for in situ III-V semiconductor dry-etch monitoring Barzen L, Kleinschmidt AK, Strassner J, Doering C, Fouckhardt H, Bock W, Wahl M, Kopnarski M Applied Surface Science, 357, 530, 2015 |
| 8 |
Investigation of surface features for 17.2% efficiency multi-crystalline silicon solar cells Park KM, Lee MB, Choi SY Solar Energy Materials and Solar Cells, 132, 356, 2015 |
| 9 |
Novel non-metallic non-acidic approach to generate sub-wavelength surface structures for inline-diffused multicrystalline silicon wafer solar cells Basu PK, Chakraborty S, Hameiri Z, Boreland MB Applied Surface Science, 307, 689, 2014 |
| 10 |
Surface Modification of Absorbable Magnesium Stents by Reactive Ion Etching Galvin E, Morshed MM, Cummins C, Daniels S, Lally C, MacDonald B Plasma Chemistry and Plasma Processing, 33(6), 1137, 2013 |