검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Lateral solid phase epitaxy of amorphously grown Si1-xGex layers on SiO2/Si(100) substrates using in-situ RPCVD postannealing Skibitzki O, Yamamoto Y, Schubert MA, Tillack B Thin Solid Films, 593, 91, 2015 |
| 2 |
High strain embedded-SiGe via low temperature reduced pressure chemical vapor deposition He H, Brabant P, Chung K, Shinriki M, Adam T, Reznicek A, Sadana D, Hasaka S, Francis T Thin Solid Films, 520(8), 3175, 2012 |
| 3 |
Gas phase particle formation and elimination on Si (100) in low temperature reduced pressure chemical vapor deposition silicon-based epitaxial layers Shinriki M, Chung K, Hasaka S, Brabant P, He H, Adam TN, Sadana D Thin Solid Films, 520(8), 3190, 2012 |
| 4 |
Solid-phase epitaxy of amorphous silicon films by in situ postannealing using RPCVD Skibitzki O, Yamamoto Y, Schubert MA, Weidner G, Tillack B Solid-State Electronics, 60(1), 13, 2011 |