화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 An internally-matched GaN HEMTs device with 45.2 W at 8 GHz for X-band application
Wang XL, Chen TS, Xiao HL, Tang J, Ran JX, Zhang ML, Feng C, Hou QF, Wei M, Jiang LJ, Li JM, Wang ZG
Solid-State Electronics, 53(3), 332, 2009
2 Growth temperature dependences of InN films grown by MOCVD
Yang CB, Wang XL, Xiao HL, Zhang XB, Hua GX, Ran JX, Wang CM, Li JP, Li JM, Wang ZG
Applied Surface Science, 255(5), 3149, 2008
3 Effects of doping on the crystalline quality and composition distribution in InGaN/GaN structure grown by MOCVD
Ran JX, Wang XL, Hu GX, Li JP, Wang BZ, Xiao HL, Wang JX, Zeng YP, Li JM, Wang ZG
Journal of Crystal Growth, 298, 235, 2007
4 MOCVD-grown high-mobility Al0.3Ga0.7N/AlN/GaN HEMT structure on sapphire substrate
Wang XL, Wang CM, Hu GX, Mao HL, Fang CB, Wang JX, Ran JX, Li HP, Li JM, Wang ZG
Journal of Crystal Growth, 298, 791, 2007
5 AlGaN/AlN/GaN/SiC HEMT structure with high mobility GaN thin layer as channel grown by MOCVD
Wang XL, Hu GX, Ma ZY, Ran JX, Wang CM, Mao HL, Tang H, Li HP, Wang JX, Zeng YP, Jinmin LM, Wang ZG
Journal of Crystal Growth, 298, 835, 2007
6 1-mm gate periphery AlGaN/AIN/GaN HEMTs on SiC with output power of 9.39 W at 8 GHz
Wang XL, Cheng TS, Ma ZY, Hu G, Xiao HL, Ran JX, Wang CM, Luo WJ
Solid-State Electronics, 51(3), 428, 2007