검색결과 : 1건
No. | Article |
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1 |
Electrical properties and noise characterization of HfO2 gate dielectrics on strained SiGe layers Mallik S, Mukherjee C, Mahata C, Hota MK, Das T, Dalapati GK, Gao H, Kumar MK, Chi DZ, Sarkar CK, Maiti CK Thin Solid Films, 522, 267, 2012 |