1 |
Spectroscopic study on amorphous tantalum oxynitride thin films prepared by reactive gas-timing RF magnetron sputtering Lertvanithphol T, Rakreungdet W, Chananonnawathorn C, Eiamchai P, Limwichean S, Nuntawong N, Patthanasettakul V, Klamchuen A, Khemasiri N, Nukeaw J, Seawsakul K, Songsiriritthigul C, Chanlek N, Nakajima H, Songsiriritthigul P, Horprathum M Applied Surface Science, 492, 99, 2019 |
2 |
플라즈마 강화 원자층 증착법에 의한 TaNx 박막의 전기 전도도 조절 류성연, 최병준 Korean Journal of Materials Research, 28(4), 241, 2018 |
3 |
Three-dimensional CFD simulation of an MgO-based sorbent regeneration reactor in a carbon capture process Ghadirian E, Abbasian J, Arastoopour H Powder Technology, 318, 314, 2017 |
4 |
Investigation of Ti0.54Al0.46/Ti0.54Al0.46N multilayer films deposited by reactive gas pulsing process by nano-indentation and electron energy-loss spectroscopy Pac MJ, Pinot Y, Giljean S, Rousselot C, Delobelle P, Ulhaq-Bouillet C, Tuilier MH Thin Solid Films, 634, 96, 2017 |
5 |
Polyamidoamine-facilitated poly(ethylene glycol)/ionic liquid based pressure swing membrane absorption process for CO2 removal from shifted syngas Chau J, Jie XM, Sirkar KK Chemical Engineering Journal, 305, 212, 2016 |
6 |
Internal entrainment effects on high intensity distributed combustion using non-intrusive diagnostics Khalil AEE, Gupta AK Applied Energy, 160, 467, 2015 |
7 |
Thermal field investigation under distributed combustion conditions Khalil AEE, Gupta AK Applied Energy, 160, 477, 2015 |
8 |
Enhanced tunability of the composition in silicon oxynitride thin films by the reactive gas pulsing process Aubry E, Weber S, Billard A, Martin N Applied Surface Science, 290, 148, 2014 |
9 |
Influence of the sputtering reactive gas on the oxide and oxynitride La-Ti-O-N deposition by RF magnetron sputtering Lu Y, Le Paven-Thivet C, Benzerga R, Le Gendre L, Sharaiha A, Tessier F, Chevire F Applied Surface Science, 264, 533, 2013 |
10 |
STABILITY OF FLAME-SHOCK COUPLING IN DETONATION WAVES: 1D DYNAMICS Cole LK, Karagozian AR, Cambier JL Combustion Science and Technology, 184(10-11), 1502, 2012 |