검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Electrical and materials properties of AlN/HfO2 high-k stack with a metal gate Reid KG, Dip A, Sasaki S, Triyoso D, Samavedam S, Gilmer D, Gondran CFH Thin Solid Films, 517(8), 2712, 2009 |
| 2 |
Surface and interface roughness of ultrathin nitric oxide oxynitride gate dielectric Hegde RI, Maiti B, Rai RS, Reid KG, Tobin PJ Journal of the Electrochemical Society, 145(1), L13, 1998 |
| 3 |
Uniformity of the N2O Furnace Oxynitride Process for the Formation of Thin Tunnel Dielectrics Okada Y, Tabin PJ, Reid KG, Hegde RI, Ajuria SA Journal of the Electrochemical Society, 141(12), 3500, 1994 |