| 1 |
Sub-30 nm patterning of molecular resists based on crosslinking through tip based oxidation
Lorenzoni M, Wagner D, Neuber C, Schmidt HW, Perez-Murano F
Applied Surface Science, 442, 106, 2018 |
| 2 |
Selective etching of PDMS: Etching as a negative tone resist
Szilasi SZ, Juhasz L
Applied Surface Science, 447, 697, 2018 |
| 3 |
Selective etching of PDMS: Etching technique for application as a positive tone resist
Szilasi SZ, Cserhati C
Applied Surface Science, 457, 662, 2018 |
| 4 |
방향족 무수물 기반의 에폭시 변성 아크릴레이트 바인더 합성 및 SiO2 레지스트 제조에 관한 연구
김하림, 김도현, 김영운, 이운영, 배진영
Polymer(Korea), 42(4), 551, 2018 |
| 5 |
Synthesis of hyperbranched polyacetals containing C-(4-t-butylbenz)calix [4] resorcinarene: Resist properties for extreme ultraviolet (EUV) lithography
Kudo H, Fukunaga M, Shiotsuki K, Takeda H, Yamamoto H, Kozawa T, Watanabe T
Reactive & Functional Polymers, 131, 361, 2018 |
| 6 |
Determining the resolution of scanning microwave impedance microscopy using atomic-precision buried donor structures
Scrymgeour DA, Baca A, Fishgrab K, Simonson RJ, Marshall M, Bussmann E, Nakakura CY, Anderson M, Misra S
Applied Surface Science, 423, 1097, 2017 |
| 7 |
Co and terpolymer reactivity ratios of chemically amplified resists
Pujari NS, Wang MX, Gonsalves KE
Polymer, 118, 201, 2017 |
| 8 |
One-pot synthesis of molecular glass photoresists based on beta-cyclodextrin containing a t-butyloxy carbonyl group for i-line lithography
Li H, Zhou Z, Liu JC, Xu WJ, Liu R, Liu XY
Polymer Bulletin, 74(4), 1091, 2017 |
| 9 |
Dynamics of radical cations of poly(4-hydroxystyrene) in the presence and absence of triphenylsulfonium triflate as determined by pulse radiolysis of its highly concentrated solution
Okamoto K, Ishida T, Yamamoto H, Kozawa T, Fujiyoshi R, Umegaki K
Chemical Physics Letters, 657, 44, 2016 |
| 10 |
Non-chemically amplified resists containing polyhedral oligomeric silsesquioxane for a bilayer resist system
Woo SA, Choi SY, Kim JB
Polymer, 98, 336, 2016 |
