| 1 |
Characterizing the rheology, slip, and velocity profiles of lamellar gel networks
Datta A, Tanmay VS, Tan GX, Reynolds GW, Jamadagni SN, Larson RG
Journal of Rheology, 64(4), 851, 2020 |
| 2 |
Transfer etching of bilayer resists in oxygen-based plasmas
Mahorowala AP, Babich K, Lin Q, Medeiros DR, Petrillo K, Simons J, Angelopoulos M, Sooriyakumaran R, Hofer D, Reynolds GW, Taylor JW
Journal of Vacuum Science & Technology A, 18(4), 1411, 2000 |
| 3 |
Factors contributing to sidewall roughness in a positive-tone, chemically amplified resist exposed by x-ray lithography
Reynolds GW, Taylor JW
Journal of Vacuum Science & Technology B, 17(2), 334, 1999 |
| 4 |
Correlation of atomic force microscopy sidewall roughness measurements with scanning electron microscopy line-edge roughness measurements on chemically amplified resists exposed by x-ray lithography
Reynolds GW, Taylor JW
Journal of Vacuum Science & Technology B, 17(6), 2723, 1999 |
| 5 |
Direct measurement of x-ray mask sidewall roughness and its contribution to the overall sidewall roughness of chemically amplified resist features
Reynolds GW, Taylor JW, Brooks CJ
Journal of Vacuum Science & Technology B, 17(6), 3420, 1999 |
