| 1 |
Growth of plasma-enhanced chemical vapour deposition and hot filament plasma-enhanced chemical vapour deposition transfer-free graphene using a nickel catalyst
Othman M, Ritikos R, Rahman SA
Thin Solid Films, 685, 335, 2019 |
| 2 |
Wetting behaviour of carbon nitride nanostructures grown by plasma enhanced chemical vapour deposition technique
Kamal SAA, Ritikos R, Rahman SA
Applied Surface Science, 328, 146, 2015 |
| 3 |
Effects of hydrogen dilution on CNx film properties deposited using rf PECVD from a mixture of ethane, nitrogen and hydrogen
Othman M, Ritikos R, Khanis NH, Rashid NMA, Ab Gani SM, Rahman SA
Materials Chemistry and Physics, 144(3), 377, 2014 |
| 4 |
Catalyst free carbon nitride nanostructures prepared by rf-PECVD technique on hydrogenated amorphous carbon template
Khanis NH, Ritikos R, Othman M, Rashid NMA, Ab Gani SM, Rahman SA
Materials Chemistry and Physics, 138(2-3), 514, 2013 |
| 5 |
Effect of N-2 flow rate on the properties of CNx thin films prepared by radio frequency plasma enhanced chemical vapor deposition from ethane and nitrogen
Othman M, Ritikos R, Khanis NH, Rashid NMA, Ab Gani SM, Rahman SA
Thin Solid Films, 529, 439, 2013 |
| 6 |
Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. power
Rashid NMA, Ritikos R, Othman M, Khanis NH, Ab Gani SM, Muhamad MR, Rahman SA
Thin Solid Films, 529, 459, 2013 |
| 7 |
Effect of pre-deposited carbon layer on the formation of carbon nitride nanostructures prepared by radio-frequency plasma enhanced chemical vapour deposition
Khanis NH, Ritikos R, Othman M, Rashid NMA, Ab Gani SM, Muhamad MR, Rahman SA
Materials Chemistry and Physics, 130(1-2), 218, 2011 |
| 8 |
Effects of rf power on the structural properties of carbon nitride thin films prepared by plasma enhanced chemical vapour deposition
Othman M, Ritikos R, Khanis NH, Rashid NMA, Rahman SA, Ab Gani SM, Muhamad MR
Thin Solid Films, 519(15), 4981, 2011 |
| 9 |
Highly reflective nc-Si:H/a-CNx:H multilayer films prepared by r.f. PECVD technique
Ritikos R, Goh BT, Sharif KAM, Muhamad MR, Rahman SA
Thin Solid Films, 517(17), 5092, 2009 |
| 10 |
The effects of deposition pressure on the optical and structural properties of d.c. PECVD hydrogenated amorphous carbon films
Awang R, Tong GB, Gani SMA, Ritikos R, Rahman SA
Materials Science Forum, 517, 81, 2006 |
