1 |
Cyanide- and thiourea-free electrochemical etching of gold for microelectronics applications Hu Z, Ritzdorf T Journal of the Electrochemical Society, 154(10), D543, 2007 |
2 |
Superconformal electrochemical deposition of gold for metallization in microelectronic devices Hu ZM, Ritzdorf T Journal of the Electrochemical Society, 153(7), C467, 2006 |
3 |
Electrical waveform mediated through-mask deposition of solder bumps for wafer level packaging Kim B, Ritzdorf T Journal of the Electrochemical Society, 151(5), C342, 2004 |
4 |
Electrochemically deposited tin-silver-copper ternary solder alloys Kim B, Ritzdorf T Journal of the Electrochemical Society, 150(2), C53, 2003 |
5 |
Electrodeposition of near-eutectic SnAg solders for wafer-level packaging Kim B, Ritzdorf T Journal of the Electrochemical Society, 150(9), C577, 2003 |
6 |
Two- and three-dimensional numerical modeling of copper electroplating for advanced ULSI metallization Ritter G, McHugh P, Wilson G, Ritzdorf T Solid-State Electronics, 44(5), 797, 2000 |