검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Ultrathin membrane masks for electron projection lithography Wood OR, Trybula WJ, Greschner J, Kalt S, Bayer T, Shimizu S, Yamamoto H, Suzuki K, Gordon MS, Robinson CF, Dhaliwal RS, Thiel CW, Caldwell N, Lawliss MS, Huang C Journal of Vacuum Science & Technology B, 22(6), 3072, 2004 |
| 2 |
PREVAIL: Dynamic correction of aberrations Gordon MS, Enichen WA, Golladay SD, Pfeiffer HC, Robinson CF, Stickel W Journal of Vacuum Science & Technology B, 18(6), 3079, 2000 |
| 3 |
Projection reduction exposure with variable axis immersion lenses: Next generation lithography Pfeiffer HC, Dhaliwal RS, Golladay SD, Doran SK, Gordon MS, Groves TR, Kendall RA, Lieberman JE, Petric PF, Pinckney DJ, Quickle RJ, Robinson CF, Rockrohr JD, Senesi JJ, Stickel W, Tressler EV, Tanimoto A, Yamaguchi T, Okamoto K, Suzuki K, Okino T, Kawata S, Morita K, Suziki SC, Shimizu H, Kojima S, Varnell G, Novak WT, Stumbo DP, Sogard M Journal of Vacuum Science & Technology B, 17(6), 2840, 1999 |
| 4 |
PREVAIL: Operation of the electron optics proof-of-concept system Gordon MS, Lieberman JE, Petric PF, Robinson CF, Stickel W Journal of Vacuum Science & Technology B, 17(6), 2851, 1999 |
| 5 |
EL5: One tool for advanced x-ray and chrome on glass mask making Sturans MA, Hartley JG, Pfeiffer HC, Dhaliwal RS, Groves TR, Pavick JW, Quickle RJ, Clement CS, Dick GJ, Enichen WA, Gordon MS, Kendall RA, Kostek CA, Pinckney DJ, Robinson CF, Rockrohr JD, Safran JM, Senesi JJ, Tressler EV Journal of Vacuum Science & Technology B, 16(6), 3164, 1998 |