화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 PREVAIL-EPL alpha tool: Early results
Golladay SD, Pfeiffer HC, Bohnenkamp CA, Dhaliwal RS, Enichen WA, Gordon MS, Kendall RA, Lieberman JE, Stickel W, Rockrohr JD, Tressler EV, Tanimoto A, Yamaguchi T, Okamoto K, Suzuki K, Miura T, Okino T, Kawata S, Morita K, Suzuki SC, Shimizu H, Kojima S, Varnell G, Novak WT, Sogard M
Journal of Vacuum Science & Technology B, 19(6), 2459, 2001
2 Electron optical image correction subsystem in electron beam projection lithography
Kojima S, Stickel W, Rockrohr JD, Gordon M
Journal of Vacuum Science & Technology B, 18(6), 3017, 2000
3 PREVAIL Alpha system: Status and design considerations
Golladay SD, Pfeiffer HC, Rockrohr JD, Stickel W
Journal of Vacuum Science & Technology B, 18(6), 3072, 2000
4 Projection reduction exposure with variable axis immersion lenses: Next generation lithography
Pfeiffer HC, Dhaliwal RS, Golladay SD, Doran SK, Gordon MS, Groves TR, Kendall RA, Lieberman JE, Petric PF, Pinckney DJ, Quickle RJ, Robinson CF, Rockrohr JD, Senesi JJ, Stickel W, Tressler EV, Tanimoto A, Yamaguchi T, Okamoto K, Suzuki K, Okino T, Kawata S, Morita K, Suziki SC, Shimizu H, Kojima S, Varnell G, Novak WT, Stumbo DP, Sogard M
Journal of Vacuum Science & Technology B, 17(6), 2840, 1999
5 EL5: One tool for advanced x-ray and chrome on glass mask making
Sturans MA, Hartley JG, Pfeiffer HC, Dhaliwal RS, Groves TR, Pavick JW, Quickle RJ, Clement CS, Dick GJ, Enichen WA, Gordon MS, Kendall RA, Kostek CA, Pinckney DJ, Robinson CF, Rockrohr JD, Safran JM, Senesi JJ, Tressler EV
Journal of Vacuum Science & Technology B, 16(6), 3164, 1998
6 Performance Enhancements on IBMs El-4 Electron-Beam Lithography System
Butsch R, Enichen WA, Gordon MS, Groves TR, Hartley JG, Pavick JW, Pfeiffer HC, Quickle RJ, Rockrohr JD, Stickel W
Journal of Vacuum Science & Technology B, 13(6), 2478, 1995
7 El-4, a New-Generation Electron-Beam Lithography System
Pfeiffer HC, Davis DE, Enichen WA, Gordon MS, Groves TR, Hartley JG, Quickle RJ, Rockrohr JD, Stickel W, Weber EV
Journal of Vacuum Science & Technology B, 11(6), 2332, 1993