화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Comparative measurements on atomic layer deposited Al2O3 thin films using ex situ table top and mapping ellipsometry, as well as X-ray and VUV reflectometry
Petrik P, Gumprecht T, Nutsch A, Roeder G, Lemberger M, Juhasz G, Polgar O, Major C, Kozma P, Janosov M, Fodor B, Agocs E, Fried M
Thin Solid Films, 541, 131, 2013
2 Determination of the Dill parameters of thick positive resist for use in modeling applications
Roeder G, Liu S, Aygun G, Evanschitzky P, Erdmann A, Schellenberger M, Pfitzner L
Thin Solid Films, 519(9), 2978, 2011
3 An X-ray photoelectron spectroscopy study of ultra-thin oxynitride films
Ladas S, Sygellou L, Kennou S, Wolf M, Roeder G, Nutsch A, Rambach M, Lerch W
Thin Solid Films, 520(2), 871, 2011