검색결과 : 12건
| No. | Article |
|---|---|
| 1 |
Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography Yang JKW, Cord B, Duan HG, Berggren KK, Klingfus J, Nam SW, Kim KB, Rooks MJ Journal of Vacuum Science & Technology B, 27(6), 2622, 2009 |
| 2 |
Contrast enhancement behavior of hydrogen silsesquioxane in a salty developer Nam SW, Rooks MJ, Yang JKW, Berggren KK, Kim HM, Lee MH, Kim KB, Sim JH, Yoon DY Journal of Vacuum Science & Technology B, 27(6), 2635, 2009 |
| 3 |
Adaptive wiring for 20 nm scale epitaxial silicon Ohmic contacts to silicon nanowires Rooks MJ, Cohen GM, Chu JO, Solomon PM, Ott JA, Miller RJ, Viswanathan R, Haensch W Journal of Vacuum Science & Technology B, 25(6), 2572, 2007 |
| 4 |
Low stress development of poly(methylmethacrylate) for high aspect ratio structures Rooks MJ, Kratschmer E, Viswanathan R, Katine J, Fontana RE, MacDonald SA Journal of Vacuum Science & Technology B, 20(6), 2937, 2002 |
| 5 |
Application of 4-methyl-1-acetoxycalix[6]arene resist to complementary metal-oxide-semiconductor gate processing Rooks MJ, Aviram A Journal of Vacuum Science & Technology B, 17(6), 3394, 1999 |
| 6 |
Fabrication of electron beam generated, chirped, phase mask (1070.11-1070.66 nm) for fiber Bragg grating dispersion compensator Tiberio RC, Carr DW, Rooks MJ, Mihailov SJ, Bilodeau F, Albert J, Stryckman D, Johnson DC, Hill KO, McClelland AW, Hughes BJ Journal of Vacuum Science & Technology B, 16(6), 3237, 1998 |
| 7 |
High-Resolution Electron-Beam Lithography Using Zep-520 and Krs Resists at Low-Voltage Tanenbaum DM, Lo CW, Isaacson M, Craighead HG, Rooks MJ, Lee KY, Huang WS, Chang TH Journal of Vacuum Science & Technology B, 14(6), 3829, 1996 |
| 8 |
Resists and Processes for 1 kv Electron-Beam Microcolumn Lithography Lo CW, Rooks MJ, Lo WK, Isaacson M, Craighead HG Journal of Vacuum Science & Technology B, 13(3), 812, 1995 |
| 9 |
Coherence of Large Gratings and Electron-Beam Fabrication Techniques for Atom-Wave Interferometry Rooks MJ, Tiberio RC, Chapman M, Hammond T, Smith E, Lenef A, Rubenstein R, Pritchard D, Adams S Journal of Vacuum Science & Technology B, 13(6), 2745, 1995 |
| 10 |
Studies of 1 and 2 keV Electron-Beam Lithography Using Silicon-Containing P(Si-CMS) Resist Lo CW, Lo WK, Rooks MJ, Isaacson M, Craighead HG, Novembre AE Journal of Vacuum Science & Technology B, 13(6), 2980, 1995 |