| 1 |
Germanium nitride and oxynitride films for surface passivation of Ge radiation detectors
Maggioni G, Carturan S, Fiorese L, Pinto N, Caproli F, Napoli DR, Giarola M, Mariotto G
Applied Surface Science, 393, 119, 2017 |
| 2 |
Sequential PLD in oxygen/argon gas mixture of Al-doped ZnO thin films with improved electrical and optical properties
Coman T, Timpu D, Nica V, Vitelaru C, Rambu AP, Stoian G, Olaru M, Ursu C
Applied Surface Science, 418, 456, 2017 |
| 3 |
Pronounced effects of oxygen growth pressure on structure and properties of ZnO and AZO films laser deposited on Zeonor polymer
Inguva S, McGlynn E, Mosnier JP
Thin Solid Films, 621, 171, 2017 |
| 4 |
Characteristics of silicon oxynitride films grown by using neutral-beams and inductively coupled plasma
Kim J, Kim DC, Kim YW
Thin Solid Films, 642, 281, 2017 |
| 5 |
High mobility thin film transistors based on zinc nitride deposited at room temperature
Dominguez MA, Pau JL, Gomez-Castano M, Luna-Lopez JA, Rosales P
Thin Solid Films, 619, 261, 2016 |
| 6 |
Room Temperature UV treated WO3 thin films for electrochromic devices on paper substrate
Danine A, Cojocaru L, Faure C, Olivier C, Toupance T, Campet G, Rougier A
Electrochimica Acta, 129, 113, 2014 |
| 7 |
Growth of polycrystalline Ag/Ni multilayers at room temperature
Muhammad Y, Magnus F, Thersleff T, Poulopoulos P, Kapaklis V, Leifer K, Hjorvarsson B
Thin Solid Films, 558, 184, 2014 |
| 8 |
Room temperature deposition of high figure of merit Al-doped zinc oxide by pulsed-direct current magnetron sputtering: Influence of energetic negative ion bombardment on film's optoelectronic properties
Fumagalli F, Marti-Rujas J, Di Fonzo F
Thin Solid Films, 569, 44, 2014 |
| 9 |
Improving the uncommon (110) growing orientation of Al-doped ZnO thin films through sequential pulsed laser deposition
Coman T, Ursu EL, Nica V, Tiron V, Olaru M, Cotofana C, Dobromir M, Coroaba A, Dragos OG, Lupu N, Caltun OF, Ursu C
Thin Solid Films, 571, 198, 2014 |
| 10 |
Uniformity of gallium doped zinc oxide thin film prepared by pulsed laser deposition
Mitsugi F, Umeda Y, Sakai N, Ikegami T
Thin Solid Films, 518(22), 6334, 2010 |
