화학공학소재연구정보센터
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No. Article
1 Deposition of aluminum-doped zinc oxide thin films for optical applications using rf and dc magnetron sputter deposition
Sivakumar K, Rossnagel SM
Journal of Vacuum Science & Technology A, 28(4), 515, 2010
2 Electrochemical Characterization of Thin Film Electrodes Toward Developing a DNA Transistor
Harrer S, Ahmed S, Afzali-Ardakani A, Luan BQ, Waggoner PS, Shao XY, Peng HB, Goldfarb DL, Martyna GJ, Rossnagel SM, Deligianni L, Stolovitzky GA
Langmuir, 26(24), 19191, 2010
3 Alteration of Cu conductivity in the size effect regime
Rossnagel SM, Kuan TS
Journal of Vacuum Science & Technology B, 22(1), 240, 2004
4 Thin film deposition with physical vapor deposition and related technologies
Rossnagel SM
Journal of Vacuum Science & Technology A, 21(5S), S74, 2003
5 Diffusion barrier properties of very thin TAN with high nitrogen concentration
Rossnagel SM, Kim H
Journal of Vacuum Science & Technology B, 21(6), 2550, 2003
6 Plasma-enhanced atomic layer deposition of tantalum thin films: the growth and film properties
Kim H, Rossnagel SM
Thin Solid Films, 441(1-2), 311, 2003
7 Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
Kim H, Rossnagel SM
Journal of Vacuum Science & Technology A, 20(3), 802, 2002
8 Time development of microstructure and resistivity for very thin Cu films
Rossnagel SM, Kuan TS
Journal of Vacuum Science & Technology A, 20(6), 1911, 2002
9 Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
Kim H, Cabral C, Lavoie C, Rossnagel SM
Journal of Vacuum Science & Technology B, 20(4), 1321, 2002
10 Phase transformation of thin sputter-deposited tungsten films at room temperature
Rossnagel SM, Noyan IC, Cabral C
Journal of Vacuum Science & Technology B, 20(5), 2047, 2002