화학공학소재연구정보센터
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No. Article
1 Pulsed plasma-enhanced chemical vapor deposition of Al2O3-TiO2 nanolaminates
Rowlette PC, Wolden CA
Thin Solid Films, 518(12), 3337, 2010
2 Self-Limiting Deposition of Anatase TiO2 at Low Temperature by Pulsed PECVD
Kubala NG, Rowlette PC, Wolden CA
Electrochemical and Solid State Letters, 12(7), H259, 2009
3 Self-limiting deposition of semiconducting ZnO by pulsed plasma-enhanced chemical vapor deposition
Rowlette PC, Allen CG, Bromley OB, Wolden CA
Journal of Vacuum Science & Technology A, 27(4), 761, 2009
4 Enhancement of metal oxide deposition rate and quality using pulsed plasma-enhanced chemical vapor deposition at low frequency
Seman MT, Richards DN, Rowlette PC, Kubala NG, Wolden CA
Journal of Vacuum Science & Technology A, 26(5), 1213, 2008