화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Ferroelectric properties of SOS and SOI pseudo-MOSFETs with HfO2 interlayers
Popov VP, Antonov VA, Ilnitsky MA, Tyschenko IE, Vdovin VI, Miakonkikh AV, Rudenko KV
Solid-State Electronics, 159, 63, 2019
2 Analytical comparison of atomic layer deposition of oxide films inside trench and hole nanostructures
Fadeev AV, Rudenko KV
Thin Solid Films, 672, 83, 2019
3 Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
Chesnokov YM, Miakonkikh AV, Rogozhin AE, Rudenko KV, Vasiliev AL
Journal of Materials Science, 53(10), 7214, 2018