검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Method for measuring feature-scale planarization in copper chemical mechanical polishing processing Laursen T, Runnels SR, Basak S, Grief M, Murella K Journal of the Electrochemical Society, 150(4), G279, 2003 |
| 2 |
Validation of a large area three-dimensional erosion simulator for chemical mechanical polishing Runnels SR, Miceli F, Kim I Journal of the Electrochemical Society, 146(12), 4619, 1999 |
| 3 |
Optimizing Wafer Polishing Through Phenomenological Modeling Runnels SR, Olavson T Journal of the Electrochemical Society, 142(6), 2032, 1995 |
| 4 |
Optimizing Wafer Polishing Through Phenomenological Modeling (Vol 142, Pg 2032, 1995) Runnels SR, Olavson T Journal of the Electrochemical Society, 142(7), 2516, 1995 |
| 5 |
Tribology Analysis of Chemical-Mechanical Polishing Runnels SR, Eyman LM Journal of the Electrochemical Society, 141(6), 1699, 1994 |
| 6 |
Feature-Scale Fluid-Based Erosion Modeling for Chemical-Mechanical Polishing Runnels SR Journal of the Electrochemical Society, 141(7), 1900, 1994 |