검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Influence of hydrogen dilution on the growth of nanocrystalline silicon carbide films by low-frequency inductively coupled plasma chemical vapor deposition Cheng Q, Xu S, Chai JW, Huang SY, Ren YP, Long JD, Rutkevych PP, Ostrikov K Thin Solid Films, 516(18), 5991, 2008 |
| 2 |
Formation of Ti-Si-N film using low frequency, high density inductively coupled plasma process Ee YC, Chen Z, Chan L, See KH, Law SB, Xu S, Tsakadze ZL, Rutkevych PP, Zeng KY, Shen L Journal of Vacuum Science & Technology B, 23(6), 2444, 2005 |