화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Alignment with exposed resist in photolithography
Burm J, Tate A, Kopf RF, Ryan RW, Hamm RA, Chirovsky LM
Journal of Vacuum Science & Technology B, 17(3), 905, 1999
2 Side-by-side wafer bonding of InP for use with stepper-based lithography
Ryan RW, Kopf RF, Tate A, Burm J, Hamm RA
Journal of Vacuum Science & Technology B, 16(4), 2110, 1998
3 Dielectric-assisted trilayer lift-off process for improved metal definition
Ryan RW, Kopf RF, Hamm RA, Malik RJ, Masaitis R, Opila R
Journal of Vacuum Science & Technology B, 16(5), 2759, 1998