검색결과 : 14건
No. | Article |
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1 |
Effects of thickness and geometric variations in the oxide gate stack on the nonvolatile memory behaviors of charge-trap memory thin-film transistors Bak JY, Kim SJ, Byun CW, Pi JE, Ryu MK, Hwang CS, Yoon SM Solid-State Electronics, 111, 153, 2015 |
2 |
A simple shift register circuit for depletion-mode oxide TFTs Pi JE, Ryu MK, Hwang CS, Park SHK, Yoon SM, Lym H, Kim Y, Oh H, Park K Solid-State Electronics, 79, 2, 2013 |
3 |
Comparative studies on electrical bias temperature instabilities of In-Ga-Zn-O thin film transistors with different device configurations Ryu MK, Park SHK, Hwang CS, Yoon SM Solid-State Electronics, 89, 171, 2013 |
4 |
Light and bias stability of a-IGZO TFT fabricated by r.f. magnetron sputtering Huh JY, Seo SB, Park HS, Jeon JH, Choe HH, Lee KW, Seo JH, Ryu MK, Park SHK, Hwang CS Current Applied Physics, 11(5), S49, 2011 |
5 |
Effects of Hf incorporation in solution-processed Hf-InZnO TFTs Jeong WH, Kim GH, Kim DL, Shin HS, Kim HJ, Ryu MK, Park KB, Seon JB, Lee SY Thin Solid Films, 519(17), 5740, 2011 |
6 |
Effects of the composition of sputtering target on the stability of InGaZnO thin film transistor Huh JY, Jeon JH, Choe HH, Lee KW, Seo JH, Ryu MK, Park SHK, Hwang CS, Cheong WS Thin Solid Films, 519(20), 6868, 2011 |
7 |
The Effect of Density-of-State on the Temperature and Gate Bias-Induced Instability of InGaZnO Thin Film Transistors Ji KH, Kim JI, Jung HY, Park SY, Mo YG, Jeong JH, Kwon JY, Ryu MK, Lee SY, Choi R, Jeong JK Journal of the Electrochemical Society, 157(11), H983, 2010 |
8 |
A study on the Raman spectra of Al-doped and Ga-doped ZnO ceramics Jang MS, Ryu MK, Yoon MH, Lee SH, Kim HK, Onodera A, Kojima S Current Applied Physics, 9(3), 651, 2009 |
9 |
Threshold Voltage Control of Amorphous Gallium Indium Zinc Oxide TFTs by Suppressing Back-Channel Current Son KS, Kim TS, Jung JS, Ryu MK, Park KB, Yoo BW, Park K, Kwon JY, Lee SY, Kim JM Electrochemical and Solid State Letters, 12(1), H26, 2009 |
10 |
Transparent thin-film transistors with zinc oxide semiconductor fabricated by reactive sputtering using metallic zinc target Cheong WS, Ryu MK, Shin JH, Park SHK, Hwang CS Thin Solid Films, 516(22), 8159, 2008 |