화학공학소재연구정보센터
검색결과 : 14건
No. Article
1 Effects of thickness and geometric variations in the oxide gate stack on the nonvolatile memory behaviors of charge-trap memory thin-film transistors
Bak JY, Kim SJ, Byun CW, Pi JE, Ryu MK, Hwang CS, Yoon SM
Solid-State Electronics, 111, 153, 2015
2 A simple shift register circuit for depletion-mode oxide TFTs
Pi JE, Ryu MK, Hwang CS, Park SHK, Yoon SM, Lym H, Kim Y, Oh H, Park K
Solid-State Electronics, 79, 2, 2013
3 Comparative studies on electrical bias temperature instabilities of In-Ga-Zn-O thin film transistors with different device configurations
Ryu MK, Park SHK, Hwang CS, Yoon SM
Solid-State Electronics, 89, 171, 2013
4 Light and bias stability of a-IGZO TFT fabricated by r.f. magnetron sputtering
Huh JY, Seo SB, Park HS, Jeon JH, Choe HH, Lee KW, Seo JH, Ryu MK, Park SHK, Hwang CS
Current Applied Physics, 11(5), S49, 2011
5 Effects of Hf incorporation in solution-processed Hf-InZnO TFTs
Jeong WH, Kim GH, Kim DL, Shin HS, Kim HJ, Ryu MK, Park KB, Seon JB, Lee SY
Thin Solid Films, 519(17), 5740, 2011
6 Effects of the composition of sputtering target on the stability of InGaZnO thin film transistor
Huh JY, Jeon JH, Choe HH, Lee KW, Seo JH, Ryu MK, Park SHK, Hwang CS, Cheong WS
Thin Solid Films, 519(20), 6868, 2011
7 The Effect of Density-of-State on the Temperature and Gate Bias-Induced Instability of InGaZnO Thin Film Transistors
Ji KH, Kim JI, Jung HY, Park SY, Mo YG, Jeong JH, Kwon JY, Ryu MK, Lee SY, Choi R, Jeong JK
Journal of the Electrochemical Society, 157(11), H983, 2010
8 A study on the Raman spectra of Al-doped and Ga-doped ZnO ceramics
Jang MS, Ryu MK, Yoon MH, Lee SH, Kim HK, Onodera A, Kojima S
Current Applied Physics, 9(3), 651, 2009
9 Threshold Voltage Control of Amorphous Gallium Indium Zinc Oxide TFTs by Suppressing Back-Channel Current
Son KS, Kim TS, Jung JS, Ryu MK, Park KB, Yoo BW, Park K, Kwon JY, Lee SY, Kim JM
Electrochemical and Solid State Letters, 12(1), H26, 2009
10 Transparent thin-film transistors with zinc oxide semiconductor fabricated by reactive sputtering using metallic zinc target
Cheong WS, Ryu MK, Shin JH, Park SHK, Hwang CS
Thin Solid Films, 516(22), 8159, 2008