검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Characterization of a time multiplexed inductively coupled plasma etcher Ayon AA, Braff R, Lin CC, Sawin HH, Schmidt MA Journal of the Electrochemical Society, 146(1), 339, 1999 |
| 2 |
Anisotropic Reactive Ion Etching of Silicon Using SF6/O-2/Chf3 Gas Mixtures Legtenberg R, Jansen H, Deboer M, Elwenspoek M Journal of the Electrochemical Society, 142(6), 2020, 1995 |