검색결과 : 19건
No. | Article |
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1 |
Loss of implanted heavy elements during annealing of ultra-shallow ion-implanted silicon: The complete picture Chan TK, Koh SY, Fang V, Markwitz A, Osipowicz T Applied Surface Science, 314, 322, 2014 |
2 |
C-V profiling of ultra-shallow junctions using step-like background profiles Popadic M, Milovanovic V, Xu CQ, Sarubbi F, Nanver LK Solid-State Electronics, 54(9), 890, 2010 |
3 |
Laser activation of Ultra Shallow Junctions (USJ) doped by Plasma Immersion Ion Implantation (PIII) Vervisch V, Larmande Y, Delaporte P, Sarnet T, Sentis M, Etienne H, Torregrosa F, Cristiano F, Fazzini PF Applied Surface Science, 255(10), 5647, 2009 |
4 |
Comparison between the SIMS and MEIS techniques for the characterization of ultra shallow arsenic implants Giubertoni D, Bersani A, Barozzi M, Pederzoli S, Iacob E, van den Berg JA, Werner M Applied Surface Science, 252(19), 7214, 2006 |
5 |
Boron ultra low energy SIMS depth profiling improved by rotating stage Bersani M, Giubertoni D, Iacob E, Barozzi M, Pederzoli S, Vanzetti L, Anderle M Applied Surface Science, 252(19), 7315, 2006 |
6 |
A novel 50 nm vertical MOSFET with a dielectric pocket Jayanarayanan SK, Dey S, Donnelly JP, Banerjee SK Solid-State Electronics, 50(5), 897, 2006 |
7 |
Excimer laser annealing for shallow junction formation in SI power MOS devices Fortunato G, Privitera V, La Magna A, Mariucci L, Cuscuna M, Svensson BG, Monakhov E, Camalleri M, Magri A, Salinas D, Simon F Thin Solid Films, 504(1-2), 2, 2006 |
8 |
Laser doping for microelectronics and microtechnology Sarnet T, Kerrien G, Yaakoubi N, Bosseboeuf A, Dufour-Gergam E, Debarre D, Boulmer J, Kakushima K, Laviron C, Hernandez M, Venturini J, Bourouina T Applied Surface Science, 247(1-4), 537, 2005 |
9 |
A new technique to fabricate ultra-shallow-junctions, combining in situ vapour HCl etching and in situ doped epitaxial SiGe re-growth Loo R, Caymax M, Meunier-Beillard P, Peytier I, Holsteyns F, Kubicek S, Verheyen P, Lindsay R, Richard O Applied Surface Science, 224(1-4), 63, 2004 |
10 |
Effects of crystalline regrowth on dopant profiles in prearnorphized silicon Hopstaken MJP, Tamminga Y, Verheijen MA, Duffy R, Venezia VC, Heringa A Applied Surface Science, 231-2, 688, 2004 |