| 1 |
Ab Initio Chemical Kinetics for the Thermal Decomposition of SiH2+ and SiH3+ Ions and Related Reverse Ion-Molecule Reactions of Interest to PECVD of alpha-Si:H Films
Nguyen TN, Lee YM, Wu JS, Lin MC
Plasma Chemistry and Plasma Processing, 39(6), 1559, 2019 |
| 2 |
Optimization of intrinsic hydrogenated amorphous silicon deposited by very high-frequency plasma-enhanced chemical vapor deposition using the relationship between Urbach energy and silane depletion fraction for solar cell application
Shin C, Iftiquar SM, Park J, Kim Y, Baek S, Jang J, Kim M, Jung J, Lee Y, Kim S, Yi J
Thin Solid Films, 547, 256, 2013 |
| 3 |
On the growth mechanism of a-Si : H
Kessels WMM, Smets AHM, Marra DC, Aydil ES, Schram DC, van de Sanden MCM
Thin Solid Films, 383(1-2), 154, 2001 |
| 4 |
Anharmonic force field, vibrational energies, and barrier to inversion of SiH3-
Aarset K, Csaszar AG, Sibert EL, Allen WD, Schaefer HF, Klopper W, Noga J
Journal of Chemical Physics, 112(9), 4053, 2000 |
| 5 |
Photochemical insertion reaction of Hg in SiH4/SiD4 in low-temperature N-2, Ar, and Kr matrixes. Formation of radicals in Kr
Legay-Sommaire N, Legay F
Journal of Physical Chemistry A, 102(45), 8759, 1998 |
| 6 |
Quantum Monte-Carlo Binding-Energies for Silicon Hydrides
Greeff CW, Lester WA
Journal of Chemical Physics, 106(15), 6412, 1997 |
| 7 |
Kinetic Analyses Combining Quantum-Chemical and Quantum-Statistical Methods - Some Case-Studies
Nguyen MT, Sengupta D, Vanquickenborne LG
Journal of Physical Chemistry, 100(26), 10956, 1996 |
| 8 |
In-Situ Optical Analysis of the Gas-Phase During the Deposition of Silicon-Carbide from Methyltrichlorosilane
Ganz M, Dorval N, Lefebvre M, Pealat M, Loumagne F, Langlais F
Journal of the Electrochemical Society, 143(5), 1654, 1996 |
| 9 |
Infrared-Spectroscopy of the Siliconium Ion, Sih5+
Boo DW, Lee YT
Journal of Chemical Physics, 103(2), 514, 1995 |
| 10 |
Electron-Affinities and Gas-Phase Acidities of Organogermanium and Organotin Compounds
Brinkman EA, Salomon K, Tumas W, Brauman JI
Journal of the American Chemical Society, 117(17), 4905, 1995 |
