화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 High-rate deposition of hydrogenated amorphous silicon films using inductively coupled silane plasma
Sakikawa N, Shishida Y, Miyazaki S, Hirose M
Solar Energy Materials and Solar Cells, 66(1-4), 337, 2001
2 Real-Time Process Sensing and Metrology in Amorphous and Selective-Area Silicon Plasma-Enhanced Chemical-Vapor-Deposition Using in-Situ Mass-Spectrometry
Chowdhury AI, Read WW, Rubloff GW, Tedder LL, Parsons GN
Journal of Vacuum Science & Technology B, 15(1), 127, 1997