| 1 |
Strategy for silicon based hot-wire chemical vapor deposition without wire silicide formation
Laukart A, Harig T, Hofer M, Schafer L
Thin Solid Films, 575, 38, 2015 |
| 2 |
Microstructure analysis of the interface situation and adhesion of thermally formed nickel suicide for plated nickel copper contacts on silicon solar cells
Mondon A, Jawaid MN, Bartsch J, Glatthaar M, Glunz SW
Solar Energy Materials and Solar Cells, 117, 209, 2013 |
| 3 |
Structural and electrical characterization of the nickel silicide films formed at 850 degrees C by rapid thermal annealing of the Ni/Si(100) films
Utlu G, Artunc N, Budak S, Tari S
Applied Surface Science, 256(16), 5069, 2010 |
| 4 |
Interaction of Co nanoparticles with SiO2: silicide formation
Potoczna-Petru D, Kepinski L, Krajczyk L
Reaction Kinetics and Catalysis Letters, 97(2), 321, 2009 |
| 5 |
Silicide formation of Au thin films on (100) Si during annealing
Chang JF, Young TR, Yang Y, Ueng HY, Chang TC
Materials Chemistry and Physics, 83(2-3), 199, 2004 |
| 6 |
Transformation of Pd/SiO2 into palladium silicide during reduction at 450 and 500 degrees C
Juszczyk W, Karpinski Z, Lomot D, Pielaszek J
Journal of Catalysis, 220(2), 299, 2003 |
| 7 |
Cavity Ringdown Laser-Absorption Spectroscopy - History, Development, and Application to Pulsed Molecular-Beams
Scherer JJ, Paul JB, Okeefe A, Saykally RJ
Chemical Reviews, 97(1), 25, 1997 |
| 8 |
Effect of Deposition Temperature on Phase-Formation in Nb/Si Multilayers
Zhang M, Yu W, Wang WK
Journal of Materials Science Letters, 16(3), 241, 1997 |
| 9 |
The Formation of TiSi2 by Rta Processing
Wan WK, Wu ST
Thin Solid Films, 298(1-2), 62, 1997 |
| 10 |
Morphology of TiSi2 Films on Si Formed from Co-Deposited Ti and Si
Herner SB, Krishnamoorthy V, Naman A, Jones KS, Gossmann HJ, Tung RT
Thin Solid Films, 302(1-2), 127, 1997 |
